18th to 21st of September 2017 in Warsaw (Poland), the E-MRS Fall Meeting 2017

E-MRS Fall Meeting 2017 – Symposium Q: Synchrotron radiation and atomic layer deposition for advanced materials

The symposium will bring together the atomic layer deposition (ALD) and synchrotron radiation (SR) communities to enable the application of SR to the study of the chemistry and materials science of thin films grown by ALD for leading-edge multiple technologies.


Despite that materials deposited by ALD are already at the production level, the ALD process is not yet fully understood and thin films deposited by ALD require more sophisticated investigation. Full understanding and control of the mechanisms underlying this growth method would lead to optimization of structure of the materials and better exploitation of their properties in devices. The use of synchrotron radiation (SR) techniques, both in-situ during ALD and ex-situ on ALD deposits to characterize both the early stage of the growth and the final products is a novel activity that is nowadays seeding at major synchrotron light sources all over the world. At the same time, many new types of ALD processes are being developed, including thermally, plasma or electron enhanced ones, as well as ALD processes for spatial pattering. ALD films are widely investigated to be used in:

  • solar cells as electrode, barrier, or encapsulating layers
  • LED,
  • HEMT,
  • RRAM,
  • LMR silica-fiber sensors,
  • functional coatings for medical materials,
  • GaN power devices,
  • TSV field effect transistor,
  • MEMS.

The aim of this symposium is to gather the research communities involved in ALD and in SR and to provide a forum for them to discuss principles, results, and methodologies related to the study of ALD processes by SR experiments.

Papers relating to all aspects of the ALD, starting from different deposition method types and selection of precursors, going through laboratory- and synchrotron-based characterization methods of the surface, interface and ALD film growth and finally ending with potential applications of the ALD are invited.

Hot topics to be covered by the symposium:

  • Characterization of ALD processes and materials (metals, oxides) using synchrotron light (PES, XANES, EXAFS, GISAXS, XRD, XRR, XRF, etc.)
  • Investigation of ALD film nucleation, interface properties and growth by laboratory-based tools
  • In situ/operando monitoring of ALD processes (APXPS, infrared spectroscopy, etc.)
  • Modeling of the Atomic Layer Deposition
  • ALD method types (thermal, plasma and electron enhanced, spatial, etc.)
  • Application of ALD (solar cells, LED, HEMT, MIM capacitors, LMR silica-fiber sensors, GaN power devices, TSV field effect transistor, MEMS, etc.)

Tentative list of invited speakers:

  • J. Dendooven (Ghent University, Belgium), ALD to grow metals – Pt
  • S. Elliott (Tyndall National Institute, Ireland), Simulating Atomic Layer Deposition
  • D. Fong (Argonne National Laboratories, USA), Applying  in-situ X-ray scattering and fluorescence to monitor the ALD growth of materials
  • E. Kessels (TU Eindhoven, The Netherlands), Application of ALD in solar cells
  • J. L. MacManus-Driscoll (University of Cambridge, UK), Atmospheric pressure spatial atomic layer deposition of thin films: Reactors, doping, and devices
  • M. Ritala (University of Helsinki, Finland), ALD of thin films for microelectronics
  • T. Schenk (Namlab, Germany), ALD for memory devices
  • J. Sprenger (University of Colorado at Boulder, USA)  Low temperature Electron Enhanced ALD
  • M. Tallarida (ALBA, Spain), Characterization of ALD processes and materials using synchrotron

Tentative list of scientific committee members:

  • Manh-Hung Chu (Vietnam)
  • Chittaranjan Das (Germany)
  • Catherine Dubourdieu (Germany)
  • Karol Froehlich (Slovakei)
  • Kamil Kosiel (Poland)
  • Alessio Lamperti (Italy)
  • Alex Martinson (USA)
  • Uwe Schröder (Germany)


Manuscripts submitted to the Symposium Q, after peer-review process, will be published in the Synchrotron Radiation and Atomic Layer Deposition for Advanced Materials Special Issue of the Journal of Vacuum Science & Technology A in March/April 2018. Manuscript submission deadline is: November 15th, 2017.