AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017)

by | May 2, 2017 | Conference | 0 comments

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15th-18th of July, 2017, Denver, Colorado, USA.

AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017)

The AVS 17th International Conference on Atomic Layer Deposition (ALD 2017) featuring the 4th International Atomic Layer Etching Workshop (ALE 2017) will be a three-day meeting dedicated to the science and technology of atomic layer controlled deposition of thin films and now topics related to atomic layer etching.  Since 2001, the ALD conference has been held alternately in the United States, Europe and Asia, allowing fruitful exchange of ideas, know-how and practices between scientists. This year, the ALD conference will again incorporate the Atomic Layer Etching 2017 Workshop (ALE 2017), so that attendees can interact freely. The conference will take place Saturday, July 15-Tuesday, July 18, 2017, at the Sheraton Downtown Denver in Denver, Colorado, USA.

JVST A (Journal of Vacuum Science & Technology A) is Soliciting Research Articles for Publication in a Special January/February 2018 Issue in collaboration with  ALD 2017 Conference and the ALE Workshop. The Special Issues will be dedicated to the science and technology of atomic layer controlled deposition of thin films. While a significant fraction of the articles expected are to be based on material presented at ALD 2017 and the ALE Workshop, research articles that are on ALD and ALE but not presented at this conference are also welcome: the special issue will be open to all articles on the science and technology of ALD and ALE.

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